Axial diagnosis of radio-frequency capacitively coupled Ar/O<sub>2</sub> plasma

نویسندگان

چکیده

The capacitively coupled Ar plasma containing oxygen, driven by a radio frequency of 27.12 MHz, is investigated laser-induced photo-detachment technique assisted with Langmuir probe. plasmas different amounts oxygen are obtained changing the flow and each which controlled mass controller. axial distribution characteristic can be measured relative position probe between parallel electrodes. electron density temperature calculated from current-voltage curve scanning probe, electronegativity current curves technique. negative ion electronegativity. It shown that rate increasing, dissociative attachment molecules electrons will consume middle energy in probability function (EEPF) EEPF evolves Druyvesteyn to Maxwellian due thermalization e-e interaction applied power increasing. worth mentioning depression appear when discharging high-pressure gas oxygen. This also caused where threshold around 4.5 eV. profile linear rise pure flater phase ions such as introduced into plasma. changes little at positions. nearby sheath powered electrode collision energetic electrons. In addition, takes on shape spoon, results consequence generation loss process ambipolar-electric-field-driven diffusion center.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Capacitively-coupled radio-frequency hydrogen discharges: the role of kinetics

This paper presents a systematic characterization of capacitively-coupled radio-frequency hydrogen discharges, produced within a parallel plate cylindrical setup at different rf applied voltages (Vrf = 50− 600 V), frequencies (f = 13.56− 40.56 MHz), and pressures (p = 0.2− 1 torr). A twodimensional, time-dependent fluid model for charged particle transport is self-consistently solved coupled to...

متن کامل

Plasma inhomogeneities near the electrodes of a capacitively- coupled radio-frequency discharge containing dust particles

Small plasma spheroids are evidenced and analyzed in front of the electrodes of a capacitivelycoupled radio-frequency discharge in which dust particles are growing. These regions are characterized by a spherical shape, a slightly enhanced luminosity and are related to instabilities induced by the presence of dust particles. Several types of behaviors are identified and particularly their chaoti...

متن کامل

Particle-in-cell simulations of hollow cathode enhanced capacitively coupled radio frequency discharges

Related Articles Radio frequency discharge with control of plasma potential distribution Rev. Sci. Instrum. 83, 02A720 (2012) Optimization of gas utilization efficiency for short-pulsed electron cyclotron resonance ion source Rev. Sci. Instrum. 83, 02A342 (2012) Hollow target magnetron-sputter-type solid material ion source Rev. Sci. Instrum. 83, 02B715 (2012) Numerical study of ion energy and ...

متن کامل

Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver

The trend in dielectric etching in microelectronics fabrication with capacitively coupled plasmas is the use of multiple frequencies where a high frequency (HF, tens to hundreds of MHz) dominates ionization and a low frequency (LF, a few to tens MHz) is used to control ion energy distributions to the wafer. Process parameters, such as pressure, gas mixture and LF and HF power deposition, are im...

متن کامل

Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges

Magnetically enhanced, capacitively coupled radio frequency plasma sources are finding continued use for etching of materials for microelectronics fabrication at a time when multifrequency sources are also being developed. Magnetically enhanced reactive ion etching MERIE sources typically use magnetic fields of tens to hundreds of Gauss parallel to the substrate to either increase the plasma de...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Chinese Physics

سال: 2021

ISSN: ['1000-3290']

DOI: https://doi.org/10.7498/aps.70.20202113